1600°C Max. MIST/LPCVD System up to 6" Wafer - MIST-1600-6
HomeStore

1600°C Max. MIST/LPCVD System up to 6" Wafer - MIST-1600-6

1600°C Max. MIST/LPCVD System up to 6" Wafer - MIST-1600-6

$24,499.30

Original: $69,998.00

-65%
1600°C Max. MIST/LPCVD System up to 6" Wafer - MIST-1600-6—

$69,998.00

$24,499.30

The Story

MIST-1600-6 is a MIST/LPCVD system designed for the epitaxial growth of thin films on various substrates up to 1600°C heated by induction. It features an induction-heated graphite substrate holder with precise PID control. The boron nitride (BN) shower head enables a uniform deposition of precursors on a substrate at an elevated temperature. The system also comes with a hermetic quartz chamber for LPCVD without worries of precursor leaks. It is a unique tool for high-temperature thin film growth, especially for next-generation semiconductors, such as Ga2O3 and BN. 

SPECIFICATIONS:

Power
  • 208-240 VAC, 50/60 Hz, 3 phase
  • 15 kW
  • A 10-foot power cord is included. The power plug is not covered

CVD Chamber


   
  • Quartz chamber:              Ø8.5" OD × 20" H (Ø216 mm OD × 500 mm H)
  • 6" graphite wafer stage:   Ø165 OD × Ø155 ID × 50 mm H with an Ø8 mm hole at the back. 
  • Thermal insulation:           graphite felt
  • Gas lines:                         1/4" compression tube fittings as gas inlet and outlet.
                                             1/4" compression tube fittings as precursor inlet. 
                                             KF16 port for Pirani vacuum gauge.
                                             pressure relief valve @ 3 psi.
  • Thermocouple:                 1/4" thermocouple feedthrough with a C-type TC. 
  • Observation window:        Ø35 mm
  • Vacuum port:                    KF25
Molecular Doser (Shower Head)
  •  4" boron nitride shower head (orifice: Ø0.5 mm) designed for high-temperature uniform coating. 
  •     

 Precursor Evaporator (Bubbler)
  • 100 ml precursor bubbler made of 316 stainless steel. 
  • one heating jacket, 150°C max, K type T/C
  • The gas delivery line is covered by heating tape (150°C max) to prevent vapor condensation. 

Induction Heater
  • 15 kW 3 phase 208 -240 VAC induction power supply. 
  • 30-100 kHz. 
  • Built-in interlocks of water flow, overheating, and overpowering. 
  • Coil: Ø220 mm ID × 70 mm H, 8 mm copper, 4 turns.
  • Cooling water requirement: >30 psi, >6 L/min, T < 30°C

Temperature Control
  • Working temperature 1500°C; 1600°C max (<1hr)
  • 30 segments for PID programmable heating and cooling 
  • Built-in overheating protection and thermocouple failure protection. 
  • Temperature accuracy: ±1°C
  • Thermocouple: C type, 400 mm L. 

Pressure Gauge
  • Capacitance enhanced Pirani vacuum gauge, up to 3.8E-5 torr. 

Vacuum Generation (Optional)
  • Pfeiffer oil-free dry scroll pump, 200 L/min
  • 110 VAC or 220 VAC
  • A cold trap is recommended to condense the volatile precursors. 

Water Chiller
(Optional)
  • Digital Temperature Controlled Recirculating Water Chiller
     58L/min, 17K BTU/hr - EQ-KJ6200

Gas Mixer (Optional)

  • 2-9 Channel Gas Control System with PLC Touch Panel and PC Operation Software - EQ-GSL-LCD
    208-240VAC, 50/60 Hz
    Flow rate from 100 sccm - 5000 sccm per channel. 

Gas Detector (Optional)

  • Honeywell UL Approved Sensepoint Hydrogen Gas Detector, EQ-XCD-H2-LD

 
Dimensions

  • 700 × 1300 × 1600 mm (L × W × H

Net Weight

  • about 250 kg

Warranty
  • Limited 1 year. Consumables are not included in the warranty. 

Application Note
  • MTI recommends placing the equipment inside a fume hood in case of any precursor leaks. 
Operation Video

       
      

Description

MIST-1600-6 is a MIST/LPCVD system designed for the epitaxial growth of thin films on various substrates up to 1600°C heated by induction. It features an induction-heated graphite substrate holder with precise PID control. The boron nitride (BN) shower head enables a uniform deposition of precursors on a substrate at an elevated temperature. The system also comes with a hermetic quartz chamber for LPCVD without worries of precursor leaks. It is a unique tool for high-temperature thin film growth, especially for next-generation semiconductors, such as Ga2O3 and BN. 

SPECIFICATIONS:

Power
  • 208-240 VAC, 50/60 Hz, 3 phase
  • 15 kW
  • A 10-foot power cord is included. The power plug is not covered

CVD Chamber


   
  • Quartz chamber:              Ø8.5" OD × 20" H (Ø216 mm OD × 500 mm H)
  • 6" graphite wafer stage:   Ø165 OD × Ø155 ID × 50 mm H with an Ø8 mm hole at the back. 
  • Thermal insulation:           graphite felt
  • Gas lines:                         1/4" compression tube fittings as gas inlet and outlet.
                                             1/4" compression tube fittings as precursor inlet. 
                                             KF16 port for Pirani vacuum gauge.
                                             pressure relief valve @ 3 psi.
  • Thermocouple:                 1/4" thermocouple feedthrough with a C-type TC. 
  • Observation window:        Ø35 mm
  • Vacuum port:                    KF25
Molecular Doser (Shower Head)
  •  4" boron nitride shower head (orifice: Ø0.5 mm) designed for high-temperature uniform coating. 
  •     

 Precursor Evaporator (Bubbler)
  • 100 ml precursor bubbler made of 316 stainless steel. 
  • one heating jacket, 150°C max, K type T/C
  • The gas delivery line is covered by heating tape (150°C max) to prevent vapor condensation. 

Induction Heater
  • 15 kW 3 phase 208 -240 VAC induction power supply. 
  • 30-100 kHz. 
  • Built-in interlocks of water flow, overheating, and overpowering. 
  • Coil: Ø220 mm ID × 70 mm H, 8 mm copper, 4 turns.
  • Cooling water requirement: >30 psi, >6 L/min, T < 30°C

Temperature Control
  • Working temperature 1500°C; 1600°C max (<1hr)
  • 30 segments for PID programmable heating and cooling 
  • Built-in overheating protection and thermocouple failure protection. 
  • Temperature accuracy: ±1°C
  • Thermocouple: C type, 400 mm L. 

Pressure Gauge
  • Capacitance enhanced Pirani vacuum gauge, up to 3.8E-5 torr. 

Vacuum Generation (Optional)
  • Pfeiffer oil-free dry scroll pump, 200 L/min
  • 110 VAC or 220 VAC
  • A cold trap is recommended to condense the volatile precursors. 

Water Chiller
(Optional)
  • Digital Temperature Controlled Recirculating Water Chiller
     58L/min, 17K BTU/hr - EQ-KJ6200

Gas Mixer (Optional)

  • 2-9 Channel Gas Control System with PLC Touch Panel and PC Operation Software - EQ-GSL-LCD
    208-240VAC, 50/60 Hz
    Flow rate from 100 sccm - 5000 sccm per channel. 

Gas Detector (Optional)

  • Honeywell UL Approved Sensepoint Hydrogen Gas Detector, EQ-XCD-H2-LD

 
Dimensions

  • 700 × 1300 × 1600 mm (L × W × H

Net Weight

  • about 250 kg

Warranty
  • Limited 1 year. Consumables are not included in the warranty. 

Application Note
  • MTI recommends placing the equipment inside a fume hood in case of any precursor leaks. 
Operation Video