$20.65
Original: $59.00
-65%Cu Film on Ta/Silicon Wafer , Cu=100 nm Ta=20nm,,Si(100) B-doped ,10x5x0.525mm,R:1-20 ohm.cm, 1sp—
$59.00
$20.65The Story
Specifications:
- Cu coated Si Wafer ( 10x5 mm size )
- Thickness of highly oriented polycrystalline Cu <111> film: 100 nm
- Thickness of Ta diffusion barrier: 20-50 nm
- 10x5x 0.5 mm thickness Si wafer (Prime Grade)
- P type, B doped, <100> orientation, SSP
- Resistivities: 1-20 ohm-cm
- Surface Roughness: as grown , RA < 10 nm
- Package: One 1000 class clean room with 100 class plastic bag
- 10 pcs per package for minimum order
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Description
Specifications:
- Cu coated Si Wafer ( 10x5 mm size )
- Thickness of highly oriented polycrystalline Cu <111> film: 100 nm
- Thickness of Ta diffusion barrier: 20-50 nm
- 10x5x 0.5 mm thickness Si wafer (Prime Grade)
- P type, B doped, <100> orientation, SSP
- Resistivities: 1-20 ohm-cm
- Surface Roughness: as grown , RA < 10 nm
- Package: One 1000 class clean room with 100 class plastic bag
- 10 pcs per package for minimum order
Related Products
|
|
|
|
|
|
Thin Films A-Z |
Crystal wafer A-Z |
Plasma Cleaner |
Wafer Containers |
Dicing saw |
Film Coater |
