Thermal Evaporation System for 2" Wafer w/ 4 Sources & One Temperature Controller - GSL-1700X-EV4

• 280 mm O.D. x 260 mm I.D. x 310 mm Height quartz chamber for easy cleaning and sample loading
• 2" Dia rotatable sample holder for the uniform film coating
• Tungsten coil heater and alumina crucible for high-temperature coating up to 1700 ºC
• Precision temperature control with 30 programmable segments and +/- 1 ºC accuracy
• A high vacuum can be achieved up to 1.0E-5 Torr via optional turbopump
• The gas flow port and valve are built-in for chamber purge and CVD possibility

• Input voltage: AC 208 - 240 V 50/60 Hz, single-phase ( 110V AC is available via 1500W transformer )
• Input Power: 1,200 W
• output power:: 12 V, and 30 A max current. Recommended working current <30 A
• Power cable included without plug

• Four Alumina Evaporating Crucibles with 3 mL each capacity. Four sources can be heated one by one to achieve a multi-layer coating 
• A Tungsten coil heater with a thermocouple is built in at the bottom of the alumina crucible (for temperature control. 
• 4 pcs S type thermocouple (installed in each crucible) - heating from 200 ºC - 1500 ºC (PIC. 2)
• Optional B-type thermocouple (at extra cost) - heating from 1200 ºC - 1700 ºC
• One digital temperature controller with 30 programmable segments and +/- 1 ºC accuracy (PIC. 3)
• Recommend to limit the temperature heating / cooling rate to 0.3 ºC/s (or 20 ºC/min) below 1200 ºC, and limit to 0.15 ºC/s (or 10 ºC/min) from 1200 - 1700 ºC
• For continuous heating above 1300 ºC, please limit the operation time to less than 1 hour to preserve the service life of the bottom flange O-ring
• For fast coating up to 2000 °C, the user can remove the thermocouple, alumina thermal block, and alumina crucible, load evaporation material directly into the tungsten coil heater, and use the current manual control mode (PIC. 3)
• Four alumina crucibles (up to 1700 ºC) and two tungsten coil heaters are included. Please refer to the Optional section for ordering spare parts

• One 2" Dia. rotatable sample stage and its shutter are installed on the top flange for coating 2" wafer
• Rotating speed: 5 rpm
• The distance from the sample holder to the evaporation source is adjustable from 40 mm to 85 mm
• Please click here to learn how to adjust the position of the sample stage.

• You may a instu film thickness to install inside chamber
• Precision Thin Film & Coating Analysis Systems - TFMS-LD is available  for after coating

• The KF25 vacuum port is installed to connect to a vacuum pump
• The vacuum may reach <1E-5 Torr by pumping overnight with optional Turbo-pump
• A vacuum pump is required for coating. Please choose from the following Product Options
• Double Stage Rotary Vane Vacuum Pump with vapor trap to eliminate the oil mist, which can reach vacuum up to 1.0E-2 Torr for evaporating noble metallic materials, such as gold, silver, and organic materials. Anti-Corrosive Capacitance Diaphragm Gauge is included
• Compact Turbomolecular Vacuum Pump System is able to provide a vacuum level up to 1.0E-5 Torr for evaporating oxygen-sensitive materials, such as Al. Mg, Li, etc. A combined Pirani and cold cathode gauge are included with the pump to measure vacuum up to 1.0E-8 Torr

• 1/4 tube fitting is built-in for chamber purge or forming gas processing
• One needle valve is built-in to control the gas flowing rate

• Extra alumina crucible and tungsten coil heater can be ordered at MTI at extra cost (Click the pictures below)

• CE Certificate
• NRTL and CSA certification is available upon request

• To achieve the high vacuum required for the evaporation of some materials, users can
• Check the chamber, O-ring, and flange for any particle, fiber, or scratch. Use lint-free tissue wetted with isopropyl alcohol (IPA) to wipe clean the surface
• Use heater tape to bake the chamber at 150 ºC and pre-heat the coil heater and crucible at 500 ºC while pumping with the optional turbopump for at least 2 hours
• Pump the chamber overnight without heating if a vacuum higher than 1.0E-5 Torr is needed
• DO NOT release the vacuum or stop pumping when the coater is in evaporation operation! During the heater cool down, stop pumping or release the vacuum ONLY when the temperature is decreased below 100 ºC!

SPC2-ARSC