High Vacuum Plasma-enhanced Chemical Vapor Deposition (CCP type) - VTC-PECVD
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High Vacuum Plasma-enhanced Chemical Vapor Deposition (CCP type) - VTC-PECVD

High Vacuum Plasma-enhanced Chemical Vapor Deposition (CCP type) - VTC-PECVD

$34,999.30

Original: $99,998.00

-65%
High Vacuum Plasma-enhanced Chemical Vapor Deposition (CCP type) - VTC-PECVD—

$99,998.00

$34,999.30

The Story

VTC-PECVD is a CCP type  ( Capacitively Coupled Plasma) plasma-enhanced chemical vapor deposition (PECVD) system with a high vacuum chamber. It is designed for plasma-assisted thin-film coating at lowered temperature (200 ~ 500°C), compared to the normal deposition at 700~950°C. The high vacuum chamber also provides a clean environment which greatly improves the film size, uniformity, and film quality. 

SPECIFICATIONS

Power
  • Single-phase 208 - 240 VAC 50 / 60 Hz
  • 4000 W 
Source Power
  • One 300 W, 13.56 MHz frequency RF power source with auto coupling.
              

PECVD Growth

  • 100 mm Dia. double layer shower head with RF source for 4" wafer

  • Two precision mass flow controllers (MFCs) for two types of working gas
    • Flow rate: 0 – 100 mL/min adjustable on the touch screen control panel
  • Motorized butterfly valves allow a stable working deposition pressure from 0.1 torrs to 1 torr



Vacuum Chamber
  • Made of 304 stainless steel
  • Dimension: Dia 300 mm × 300 m H
  • Ultimate vacuum: 6E-7 torr
  • Pumping time: <6E-6 torr after 40 min pumping with turbopump
  • Leak rate: 3.8E-9 torr L/s
  • Viewport: 100 mm dia. glass
  • Fast load-lock door for quick sample loadding and retrieval. 

Vacuum Pump
  • Turbo Pump: 700 L/s Pfeiffer turbo pump 
  • Backing Pump: 240 L/min (4L/s) rotoray vane pump




Sample Stage
  • The sample holder is a rotatable and heatable stage made of the ceramic heater with copper cover
  • Sample holder size: 100 mm Dia. for. 4" wafer max
  • Rotation speed: 1 - 20 rpm adjustable for uniform coating
  • The holder temperature is PID controlled from RT to 500 °C max with an accuracy of +/- 1.0 °C 
  • Clearance: 15 ~ 65 mm between sample stage and plasma head
                  
Water Chiller
  • One digital temperature-controlled recirculating water chiller is included. (Click picture to see details)
    • Refrigeration range: 5~35 °C
    • Flow rate: 16 L/min
    • Pump pressure: 14 psi
    Gas delivery system
    (optional)
    • 2- 9 channel gas mixing and delivery system is available as an option ( Pic. 1)
    • Vapor gas delivery device is available upon request (Pic. 2&3)
    • Programmable software for customized recipes is available based on customer design
    •  Pic. 1Pic. 2Pic.3

    Net Weight of Coater
    • 160 kg

    Dimensions
    •  

    Compliance
    • CE approval
    • NRTL Certification (UL 1450) is available upon request at an extra cost  

    Warranty
    • One year limited warranty with lifetime support

    Operation Demo Video

    		             
                        
    High Vacuum Plasma-enhanced Chemical Vapor Deposition (CCP type) - VTC-PECVD - Image 2

    Details & Craftsmanship

    Every detail has been carefully considered to bring you the perfect product.

    High Vacuum Plasma-enhanced Chemical Vapor Deposition (CCP type) - VTC-PECVD - Image 3

    Details & Craftsmanship

    Every detail has been carefully considered to bring you the perfect product.

    High Vacuum Plasma-enhanced Chemical Vapor Deposition (CCP type) - VTC-PECVD - Image 4

    Details & Craftsmanship

    Every detail has been carefully considered to bring you the perfect product.

    Description

    VTC-PECVD is a CCP type  ( Capacitively Coupled Plasma) plasma-enhanced chemical vapor deposition (PECVD) system with a high vacuum chamber. It is designed for plasma-assisted thin-film coating at lowered temperature (200 ~ 500°C), compared to the normal deposition at 700~950°C. The high vacuum chamber also provides a clean environment which greatly improves the film size, uniformity, and film quality. 

    SPECIFICATIONS

    Power
    • Single-phase 208 - 240 VAC 50 / 60 Hz
    • 4000 W 
    Source Power
    • One 300 W, 13.56 MHz frequency RF power source with auto coupling.
                  

    PECVD Growth

    • 100 mm Dia. double layer shower head with RF source for 4" wafer

    • Two precision mass flow controllers (MFCs) for two types of working gas
      • Flow rate: 0 – 100 mL/min adjustable on the touch screen control panel
    • Motorized butterfly valves allow a stable working deposition pressure from 0.1 torrs to 1 torr



    Vacuum Chamber
    • Made of 304 stainless steel
    • Dimension: Dia 300 mm × 300 m H
    • Ultimate vacuum: 6E-7 torr
    • Pumping time: <6E-6 torr after 40 min pumping with turbopump
    • Leak rate: 3.8E-9 torr L/s
    • Viewport: 100 mm dia. glass
    • Fast load-lock door for quick sample loadding and retrieval. 

    Vacuum Pump
    • Turbo Pump: 700 L/s Pfeiffer turbo pump 
    • Backing Pump: 240 L/min (4L/s) rotoray vane pump




    Sample Stage
    • The sample holder is a rotatable and heatable stage made of the ceramic heater with copper cover
    • Sample holder size: 100 mm Dia. for. 4" wafer max
    • Rotation speed: 1 - 20 rpm adjustable for uniform coating
    • The holder temperature is PID controlled from RT to 500 °C max with an accuracy of +/- 1.0 °C 
    • Clearance: 15 ~ 65 mm between sample stage and plasma head
                      
    Water Chiller
    • One digital temperature-controlled recirculating water chiller is included. (Click picture to see details)
      • Refrigeration range: 5~35 °C
      • Flow rate: 16 L/min
      • Pump pressure: 14 psi
      Gas delivery system
      (optional)
      • 2- 9 channel gas mixing and delivery system is available as an option ( Pic. 1)
      • Vapor gas delivery device is available upon request (Pic. 2&3)
      • Programmable software for customized recipes is available based on customer design
      •  Pic. 1Pic. 2Pic.3

      Net Weight of Coater
      • 160 kg

      Dimensions
      •  

      Compliance
      • CE approval
      • NRTL Certification (UL 1450) is available upon request at an extra cost  

      Warranty
      • One year limited warranty with lifetime support

      Operation Demo Video