
The Story
- Growth method LEC
- Orientation (100)
- Orientation Flat N/A
- Doping S-doped
- Conductivity type N type
- Carrier Concentration 1x10E18 cmE-3
- Mobility 9000 cm2/V.S
- Standard thickness 0.5mm
- Standard size 10mm x 10mm
- Polish one-side
Related Product
| Other InAs |
InSb |
InP |
GaAs |
GaSb |
Wafer Box |
Film Coater |
RTP Furnaces |
Description
- Growth method LEC
- Orientation (100)
- Orientation Flat N/A
- Doping S-doped
- Conductivity type N type
- Carrier Concentration 1x10E18 cmE-3
- Mobility 9000 cm2/V.S
- Standard thickness 0.5mm
- Standard size 10mm x 10mm
- Polish one-side
Related Product
| Other InAs |
InSb |
InP |
GaAs |
GaSb |
Wafer Box |
Film Coater |
RTP Furnaces |












