
Original: $1,185.00
-65%$1,185.00
$414.75The Story
- Growth method VGF
- Orientation (111)A ± 0.5 Deg
- Orientation Flats (1-10) (001)
- Doping Undoped
- Conductivity type N type
- Carrier Concentration (1-3)E16 / cm-3
- Mobility >20000 cm2/V.S
- EPD <15000 / cm 2
- Resistivity: 1.3x10^-2 ohm.cm
- Standard thickness 500 ± 25 mm
- Standard diameter 50.8± 0.5mm
- Polish one side
Related Product
| Other InAs |
InSb |
InP |
GaAs |
GaSb |
Wafer Box |
Film Coater |
RTP Furnaces |
Description
- Growth method VGF
- Orientation (111)A ± 0.5 Deg
- Orientation Flats (1-10) (001)
- Doping Undoped
- Conductivity type N type
- Carrier Concentration (1-3)E16 / cm-3
- Mobility >20000 cm2/V.S
- EPD <15000 / cm 2
- Resistivity: 1.3x10^-2 ohm.cm
- Standard thickness 500 ± 25 mm
- Standard diameter 50.8± 0.5mm
- Polish one side
Related Product
| Other InAs |
InSb |
InP |
GaAs |
GaSb |
Wafer Box |
Film Coater |
RTP Furnaces |












